Invention Grant
US09455115B2 Method of adjusting a stigmator in a particle beam apparatus and a Particle beam system
有权
调整粒子束装置和粒子束系统中的扫描器的方法
- Patent Title: Method of adjusting a stigmator in a particle beam apparatus and a Particle beam system
- Patent Title (中): 调整粒子束装置和粒子束系统中的扫描器的方法
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Application No.: US14574190Application Date: 2014-12-17
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Publication No.: US09455115B2Publication Date: 2016-09-27
- Inventor: Simon Diemer
- Applicant: Carl Zeiss Microscopy GmbH
- Applicant Address: DE Jena
- Assignee: Carl Zeiss Microscopy GmbH
- Current Assignee: Carl Zeiss Microscopy GmbH
- Current Assignee Address: DE Jena
- Agency: Alston & Bird LLP
- Main IPC: H01J37/15
- IPC: H01J37/15 ; H01J37/147 ; H01J37/12 ; H01J37/285

Abstract:
A method of adjusting a stigmator in a particle beam apparatus comprises directing a particle beam onto a sample wherein the particle beam traverses a quadrupole field 37 generated by energizing at least four field generators of the stigmator; acquiring first and second images of the sample at different field strengths of the quadrupole field while energizing the at least four field generators according to a first setting of a plurality of settings; acquiring third and fourth images of the sample at different field strengths of the quadrupole field 37 while energizing the at least four field generators according to a second setting of the plurality of settings; determining a plurality of image displacements based on the first, second, third and fourth images; determining an optimum setting of the at least four field generators based on the plurality of image displacements and the plurality of settings.
Public/Granted literature
- US20160181055A1 Method of Adjusting a Stigmator in a Particle Beam Apparatus and a Particle Beam System Public/Granted day:2016-06-23
Information query
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