Invention Grant
US09455154B2 Methods for fabricating guide patterns and methods for fabricating integrated circuits using such guide patterns
有权
用于制造引导图案的方法和使用这种引导图案制造集成电路的方法
- Patent Title: Methods for fabricating guide patterns and methods for fabricating integrated circuits using such guide patterns
- Patent Title (中): 用于制造引导图案的方法和使用这种引导图案制造集成电路的方法
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Application No.: US13804112Application Date: 2013-03-14
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Publication No.: US09455154B2Publication Date: 2016-09-27
- Inventor: Gerard M. Schmid , Richard Farrell
- Applicant: GLOBALFOUNDRIES, Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES, INC.
- Current Assignee: GLOBALFOUNDRIES, INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Lorenz & Kopf, LLP
- Main IPC: H01L21/308
- IPC: H01L21/308 ; H01L21/311 ; G03F7/004 ; G03F7/20 ; H01L21/3105 ; B81C1/00
Abstract:
Methods for fabricating guide patterns and methods for fabricating integrated circuits using guide patterns are provided. In an embodiment, a method for fabricating a guide pattern includes forming a coating of a material with latent grafting sites and a photosensitive component configured to activate the latent grafting sites upon exposure over a substrate. The method exposes selected latent grafting sites in the coating to convert the selected latent grafting sites to active grafting sites. A grafting agent is bonded to the active grafting sites to form the guide pattern.
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Information query
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