Mask set and method for fabricating semiconductor device by using the same

Invention Grant

US09455202B2 Mask set and method for fabricating semiconductor device by using the same 有权

Title translation: 掩模套和使用该半导体器件的方法

Please log in to see more content

Patent Title: Mask set and method for fabricating semiconductor device by using the same
Patent Title (中): 掩模套和使用该半导体器件的方法
Application No.: US14289657

Application Date: 2014-05-29
Publication No.: US09455202B2

Publication Date: 2016-09-27
Inventor: Wei-Chi Lee , Yu-Lin Wang , Chung-Yuan Lee
Applicant: UNITED MICROELECTRONICS CORP.
Applicant Address: TW Hsin-Chu
Assignee: UNITED MICROELECTRONICS CORP.
Current Assignee: UNITED MICROELECTRONICS CORP.
Current Assignee Address: TW Hsin-Chu
Agent Winston Hsu; Scott Margo
Main IPC: H01L21/8238
IPC: H01L21/8238 ; G03F1/00

Mask set and method for fabricating semiconductor device by using the same

Abstract:

A mask set includes a first mask and a second mask. The first mask includes geometric patterns. The second mask includes at least a strip-shaped pattern with a first edge and a second edge opposite to the first edge. The strip-shaped pattern has a centerline along a long axis of the strip-shaped pattern. The first edge includes inwardly displaced segments shifting towards the centerline and each of the inwardly displaced segments overlaps each of the geometric patterns.

Abstract(Chinese):

掩模组包括第一掩模和第二掩模。第一个面具包括几何图案。第二掩模包括至少带状的图案，其具有第一边缘和与第一边缘相对的第二边缘。带状图案具有沿着带状图案的长轴的中心线。第一边缘包括朝向中心线移动的向内移位的段，并且每个向内移位的段与每个几何图案重叠。

Public/Granted literature

US20150348850A1 MASK SET AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING THE SAME Public/Granted day:2015-12-03

Information query

Espacenet

IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L21/00	专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/70	.由在一共用基片内或其上形成的多个固态组件或集成电路组成的器件或其部件的制造或处理；集成电路器件或其特殊部件的制造（由预制电组件组成的组装件的制造入H05K3/00，H05K13/00）
H01L21/77	..在公共衬底中或上面形成的由许多固态元件或集成电路组成的器件的制造或处理（电可编程只读存储器或其多步骤的制造方法入H01L27/115）
H01L21/78	...把衬底连续地分成多个独立的器件（改变表面物理特性或者半导体形状的切割入H01L21/304）
H01L21/82	....制造器件，例如每一个由许多元件组成的集成电路
H01L21/822	.....衬底是采用硅工艺的半导体的（H01L21/8258优先）
H01L21/8232	......场效应工艺
H01L21/8234	.......MIS工艺
H01L21/8238	........互补场效应晶体管，例如CMOS