Invention Grant
- Patent Title: Semiconductor optoelectronic device
- Patent Title (中): 半导体光电器件
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Application No.: US13226095Application Date: 2011-09-06
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Publication No.: US09455242B2Publication Date: 2016-09-27
- Inventor: Hsin-Ying Wang , Yi-Ming Chen , Tzu-Chieh Hsu , Chi-Hsing Chen , Chien-Kai Chung , Min-Hsun Hsieh , Chia-Liang Hsu , Chao-Hsing Chen , Chiu-Lin Yao , Chien-Fu Huang , Hsin-Mao Liu , Hsiang-Ling Chang
- Applicant: Hsin-Ying Wang , Yi-Ming Chen , Tzu-Chieh Hsu , Chi-Hsing Chen , Chien-Kai Chung , Min-Hsun Hsieh , Chia-Liang Hsu , Chao-Hsing Chen , Chiu-Lin Yao , Chien-Fu Huang , Hsin-Mao Liu , Hsiang-Ling Chang
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW100112126A 20110406
- Main IPC: H01L31/042
- IPC: H01L31/042 ; H01L33/00 ; H01L25/075 ; H01L31/18 ; H01L23/00 ; H01L33/44 ; H01L33/62

Abstract:
A semiconductor optoelectronic device comprises a growth substrate; a semiconductor epitaxial stack formed on the growth substrate comprising a sacrificial layer with electrical conductivity formed on the growth substrate; a first semiconductor material layer having a first electrical conductivity formed on the sacrificial layer, and a second semiconductor material layer having a second electrical conductivity formed on the first semiconductor material layer; and a first electrode directly formed on the growth substrate and electrically connected to the semiconductor epitaxial stack via the growth substrate.
Public/Granted literature
- US20120055532A1 SEMICONDUCTOR OPTOELECTRONIC DEVICE Public/Granted day:2012-03-08
Information query
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