Invention Grant
- Patent Title: Method of manufacturing mask
- Patent Title (中): 制作面膜的方法
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Application No.: US14021700Application Date: 2013-09-09
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Publication No.: US09457426B2Publication Date: 2016-10-04
- Inventor: Doh-Hyoung Lee , Jun Ho Jo
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: KR10-2013-0034662 20130329
- Main IPC: B23K26/00
- IPC: B23K26/00 ; C23C16/04 ; B23K26/06 ; B23K26/08 ; B23K26/12 ; C23C14/04 ; B23K26/40
Abstract:
A mask substrate that includes a first area and a second area surrounding the first area is provided. Then, a laser beam is irradiated on the mask substrate to at least partly remove a material of the second area. After that, a physical force is applied to the mask substrate to separate the first area from the mask substrate thereby forming an opening through the mask substrate.
Public/Granted literature
- US20140291306A1 METHOD OF MANUFACTURING MASK Public/Granted day:2014-10-02
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