Invention Grant
US09459533B2 Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist
有权
聚合物组合物，包含聚合物组合物的光致抗蚀剂和包含光刻胶的涂覆制品
- Patent Title: Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist
- Patent Title (中): 聚合物组合物，包含聚合物组合物的光致抗蚀剂和包含光刻胶的涂覆制品
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Application No.: US13926004Application Date: 2013-06-25
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Publication No.: US09459533B2Publication Date: 2016-10-04
- Inventor: Matthew D. Christianson , Matthew M. Meyer , Owendi Ongayi
- Applicant: Dow Global Technologies LLC , Rohm and Haas Electronic Materials LLC
- Applicant Address: US MI Midland
- Assignee: DOW GLOBAL TECHNOLOGIES LLC
- Current Assignee: DOW GLOBAL TECHNOLOGIES LLC
- Current Assignee Address: US MI Midland
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/039
- IPC: G03F7/039 ; C08F14/18 ; G03F7/00
Abstract:
A copolymer comprises the polymerized product of a dissolution-rate controlling monomer having the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III): wherein Ra, Rb, Rc, L, X, and Z1 are defined herein. A photoresist composition comprising the copolymer is described, as is an article coated with the photoresist composition, and a method of forming an electronic device using the photoresist composition.
Public/Granted literature
Information query
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