Invention Grant
- Patent Title: Process for forming organic semiconductor film
- Patent Title (中): 用于形成有机半导体膜的方法
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Application No.: US14842445Application Date: 2015-09-01
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Publication No.: US09472760B2Publication Date: 2016-10-18
- Inventor: Yoshihisa Usami
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2013-054250 20130315
- Main IPC: H01L51/40
- IPC: H01L51/40 ; H01L51/00 ; H01L51/56 ; H01L51/05

Abstract:
In the present invention, an organic semiconductor film is formed by using a cover member which is disposed on a substrate for forming the organic semiconductor film and forms a space relative to the substrate, filling the space between the cover member and the substrate with a solution, and drying the filled solution, wherein the cover member has a control surface on which an uppermost part most separated from the substrate and a descending part provided on both sides in the y-direction of the uppermost part so as to descend from the uppermost part toward the substrate are formed.
Public/Granted literature
- US20150372233A1 PROCESS FOR FORMING ORGANIC SEMICONDUCTOR FILM Public/Granted day:2015-12-24
Information query
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