Blue light blocking and light source

    公开(公告)号:US10714665B2

    公开(公告)日:2020-07-14

    申请号:US16257024

    申请日:2019-01-24

    Abstract: The present invention provides a blue light blocking film including a selective reflection layer, in which the selective reflection layer exhibits selective reflection having a center wavelength in a wavelength range of 450 nm to 500 nm, a half-width of the selective reflection is 20 nm to 45 nm, a light transmittance of the selective reflection layer at the center wavelength is 50% or less, and a light transmittance of the selective reflection layer at any wavelength in a wavelength range of more than 500 nm and 780 nm or less is 60% or more. The blue light blocking film of the present invention has high light transmittance in a visible light range, while effectively blocking blue light, and has a reduced yellowish tint. The blue light blocking film of the present invention is used for light sources and the like, and is capable of effectively blocking blue light.

    Method of manufacturing film using alignment material

    公开(公告)号:US10608119B2

    公开(公告)日:2020-03-31

    申请号:US16114610

    申请日:2018-08-28

    Abstract: Provided is a method of manufacturing a film, including: a manufacturing step of forming a film by performing movement, in a state in which a blade surface of a coating blade disposed to be spaced so as to face a substrate surface of a substrate is in contact with a solution for forming a film which is provided between the blade surface and the substrate surface, in a first direction in a plane parallel to the substrate surface, in which the solution is stored in a liquid reservoir between the blade surface and the substrate surface, and at least a portion of an outer peripheral end portion of the coating blade which is in contact with the solution is tilted with respect to the first direction in a plane parallel to the substrate surface. Accordingly, a method of manufacturing a film for forming a high quality film with high productivity is provided.

    Illumination apparatus used for plant cultivation

    公开(公告)号:US09807945B2

    公开(公告)日:2017-11-07

    申请号:US14577120

    申请日:2014-12-19

    CPC classification number: A01G7/045 F21V9/14 Y02P60/146

    Abstract: The present invention provides an illumination apparatus for plant cultivation, including a unit configured to change light in any wavelength region of 300 nm or higher and 600 nm or lower (wavelengths of 452 nm to 474 nm, for example) to light in the wavelength region having dominantly a right-circularly polarized light component. The illumination apparatus of the present invention enables irradiation with light that is capable of giving a specific effect in plant cultivation.

    Plant illumination apparatus
    9.
    发明授权

    公开(公告)号:US11197429B2

    公开(公告)日:2021-12-14

    申请号:US16268631

    申请日:2019-02-06

    Abstract: An object is to provide a plant illumination apparatus that can output light having a high degree of circular polarization in the target wavelength range. This object is achieved by having a reflective-type polarizing plate having an effective wavelength range, a light-emitting device, and a reflective plate configured to reflect light emitted from the light-emitting device and satisfying: λ1>λ2,λ2>λ3, and w>30 nm wherein λ1 is the center wavelength of the effective wavelength range of the reflective-type polarizing plate, λ2 is the center wavelength of the light-emitting device, w is the full width at half maximum of the transmittance of the reflective-type polarizing plate, and λ3 is the shorter wavelength of the wavelengths at the full width at half maximum.

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