Invention Grant
US09472760B2 Process for forming organic semiconductor film 有权
用于形成有机半导体膜的方法

Process for forming organic semiconductor film
Abstract:
In the present invention, an organic semiconductor film is formed by using a cover member which is disposed on a substrate for forming the organic semiconductor film and forms a space relative to the substrate, filling the space between the cover member and the substrate with a solution, and drying the filled solution, wherein the cover member has a control surface on which an uppermost part most separated from the substrate and a descending part provided on both sides in the y-direction of the uppermost part so as to descend from the uppermost part toward the substrate are formed.
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