Invention Grant
- Patent Title: Semiconductor ESD circuit and method
-
Application No.: US14690739Application Date: 2015-04-20
-
Publication No.: US09478979B2Publication Date: 2016-10-25
- Inventor: Krzysztof Domanski , Wolfgang Soldner , Cornelius Christian Russ , David Alvarez , Adrien Ille
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater Matsil, LLP
- Main IPC: H02H9/00
- IPC: H02H9/00 ; H02H9/04 ; H01L27/02 ; H01L29/06 ; H01L29/10

Abstract:
In an embodiment, an electrostatic discharge (ESD) circuit for providing protection between a first node and a second node includes a first MOS device having a first source/drain coupled to a first node, and a second source/drain coupled to an intermediate node. The ESD circuit also includes a first capacitor coupled between a gate of the first MOS device and the first node, a first resistor coupled between the gate of the first MOS device the intermediate node, a second MOS device having a first source/drain coupled to the intermediate node, and a second source/drain coupled to the second node, a second capacitor coupled between a gate of the second MOS device and the first node, and a second resistor coupled between the gate of the second MOS device and the second node.
Public/Granted literature
- US20150229126A1 Semiconductor ESD Circuit and Method Public/Granted day:2015-08-13
Information query