Invention Grant
- Patent Title: Method of forming pattern and developer for use in the method
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Application No.: US14749035Application Date: 2015-06-24
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Publication No.: US09482958B2Publication Date: 2016-11-01
- Inventor: Yuichiro Enomoto , Shinji Tarutani , Sou Kamimura , Kaoru Iwato , Keita Kato , Kana Fujii
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-150180 20100630; JP2011-135554 20110617
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/42 ; G03F7/038 ; G03F7/039 ; G03F7/32 ; G03F7/004
Abstract:
Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.
Public/Granted literature
- US20150293454A1 METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD Public/Granted day:2015-10-15
Information query
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