Invention Grant
- Patent Title: Contour-based array inspection of patterned defects
- Patent Title (中): 基于轮廓的阵列检查图案缺陷
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Application No.: US14062761Application Date: 2013-10-24
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Publication No.: US09483819B2Publication Date: 2016-11-01
- Inventor: Chien-Huei Chen , Ajay Gupta , Thanh Huy Ha , Jianwei Wang , Hedong Yang , Christopher Michael Maher , Michael J. Van Riet
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Okamoto & Benedicto LLP
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G01N23/225 ; H01L21/66

Abstract:
One embodiment relates to a method of inspecting an array of cells on a substrate. A reference image is generated using a cell image that was previously determined to be defect free. A reference contour image which includes contours of the reference image is also generated. The reference contour image is used to detect defects in the array of cells on the substrate. Another embodiment relates to a system for detecting defects in an array on a substrate. Other embodiments, aspects and features are also disclosed.
Public/Granted literature
- US20140212024A1 CONTOUR-BASED ARRAY INSPECTION OF PATTERNED DEFECTS Public/Granted day:2014-07-31
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