Invention Grant
- Patent Title: Method and apparatus for design of a metrology target
- Patent Title (中): 计量目标设计方法和设备
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Application No.: US14578036Application Date: 2014-12-19
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Publication No.: US09494874B2Publication Date: 2016-11-15
- Inventor: Guangqing Chen , Jen-Shiang Wang , Shufeng Bai
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03F7/20

Abstract:
A system to, and a method to, select a metrology target for use on a substrate including performing a lithographic simulation for a plurality of points on a process window region for each proposed target, identifying a catastrophic error for any of the plurality of points for each proposed target, eliminating each target having a catastrophic error at any of the plurality of points, performing a metrology simulation to determine a parameter over the process window for each target not having a catastrophic error at any of the plurality of points, and using the one or more resulting determined simulated parameters to evaluate target quality.
Public/Granted literature
- US20150185626A1 METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET Public/Granted day:2015-07-02
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