Invention Grant
- Patent Title: ICP emission spectrometer
- Patent Title (中): ICP发射光谱仪
-
Application No.: US14674052Application Date: 2015-03-31
-
Publication No.: US09500524B2Publication Date: 2016-11-22
- Inventor: Osamu Matsuzawa
- Applicant: Hitachi High-Tech Science Corporation
- Applicant Address: JP Minato-ku, Tokyo
- Assignee: Hitachi High-Tech Science Corporation
- Current Assignee: Hitachi High-Tech Science Corporation
- Current Assignee Address: JP Minato-ku, Tokyo
- Agency: Banner & Witcoff, Ltd.
- Priority: JP2014-072522 20140331
- Main IPC: G01J3/30
- IPC: G01J3/30 ; G01J3/443 ; G01N21/73 ; G01J3/06 ; G01N21/68

Abstract:
An ICP emission spectrometer is schematically configured to include an inductively coupled plasma generation unit, a light condensing unit, a spectroscope, a two-dimensional detection unit and a controller. The two-dimensional detection unit includes a CCD image sensor which has multiple pixels laid in a planar shape and detects emission light by causing the emission light emitted from the spectroscope to be imaged on the multiple pixels. Then, the controller determines a pixel used in detecting the emission light among the multiple pixels in accordance with an imaging shape of detection-targeted emission light.
Public/Granted literature
- US20150276484A1 ICP Emission Spectrometer Public/Granted day:2015-10-01
Information query