Invention Grant
- Patent Title: Semiconductor magnetic memory device and method for manufacturing the same
- Patent Title (中): 半导体磁存储器件及其制造方法
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Application No.: US14738814Application Date: 2015-06-12
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Publication No.: US09502291B2Publication Date: 2016-11-22
- Inventor: Kilho Lee , Shinhee Han
- Applicant: Kilho Lee , Shinhee Han
- Applicant Address: KR
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR
- Agency: Renissance IP Law Group LLP
- Priority: KR10-2014-0084651 20140707
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L29/423 ; H01L21/311 ; H01L29/66 ; H01L43/08 ; H01L43/10 ; H01L43/12

Abstract:
A semiconductor memory device includes a first insulating layer covering a substrate, a first contact plug and a second contact plug each penetrating the first insulating layer, a first data storage element disposed on the first contact plug, and a second data storage element disposed on the second contact plug. The first contact plug includes a vertically extending portion and a horizontally extending portion arranged between the vertically extending portion and the first data storage element, and the second contact plug extends substantially vertically from a top surface of the substrate. The first data storage element is laterally spaced apart from the vertically extending portion when viewed in plan view. The first data storage element is disposed on the horizontally extending portion.
Public/Granted literature
- US20160005739A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2016-01-07
Information query
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