Invention Grant
- Patent Title: Thin film transistor and manufacturing method thereof
- Patent Title (中): 薄膜晶体管及其制造方法
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Application No.: US14249329Application Date: 2014-04-09
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Publication No.: US09502574B2Publication Date: 2016-11-22
- Inventor: Seung-Hwan Cho , Young Ki Shin , Dong Hwan Shim , Yoon Ho Khang , Hyun Jae Na
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Lewis Roca Rothgerber Christie LLP
- Priority: KR10-2013-0109888 20130912
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/66

Abstract:
A thin film transistor includes: a first semiconductor layer; a second semiconductor layer disposed on the first semiconductor layer; and a pair of source region and drain region formed by doping both sides of the first semiconductor layer and the second semiconductor layer with impurities, and the source region includes a first source layer on the same plane as the first semiconductor layer and a second source layer on the same plane as the second semiconductor layer, and the drain region includes a first drain layer on the same plane as the first semiconductor layer and a second drain layer on the same plane as the second semiconductor layer, and only one of the first semiconductor layer and the second semiconductor layer is a transistor channel layer.
Public/Granted literature
- US20150069399A1 THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF Public/Granted day:2015-03-12
Information query
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