Invention Grant
- Patent Title: Methods of manufacturing integrated circuit devices by using photomask cleaning compositions
- Patent Title (中): 使用光掩模清洗组合物制造集成电路器件的方法
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Application No.: US14750651Application Date: 2015-06-25
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Publication No.: US09507255B2Publication Date: 2016-11-29
- Inventor: Ho-young Kim , Dong-min Kang , Sung-bae Kim , Hoon Han , Hong-kwon Youn , Hyo-sun Lee , Young-taek Hong
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR10-2014-0146434 20141027
- Main IPC: C23G1/02
- IPC: C23G1/02 ; G03F1/82 ; C11D11/00 ; C11D7/26 ; C11D7/34 ; B08B3/00 ; B08B3/04
Abstract:
In a method of manufacturing an integrated circuit (IC) device, a photomask is wet-processed using a cleaning composition comprising an organic acid, an oxidizing agent, and deionized water (DIW).
Public/Granted literature
- US20160116836A1 METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES BY USING PHOTOMASK CLEANING COMPOSITIONS Public/Granted day:2016-04-28
Information query
