Invention Grant
- Patent Title: Substrate holder and method of manufacturing a substrate holder
- Patent Title (中): 基板支架及其制造方法
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Application No.: US14373291Application Date: 2013-01-17
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Publication No.: US09507274B2Publication Date: 2016-11-29
- Inventor: Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/050826 WO 20130117
- International Announcement: WO2013/113569 WO 20130808
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20 ; B23Q3/18 ; B05D3/06 ; B05D5/00 ; B23K26/00
Abstract:
An object holder (100) for a lithographic apparatus has a main body (400) having a surface (400a). A plurality of burls (406) to support an object are formed on the surface or in apertures of a thin-film stack (410, 440, 450). At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
Public/Granted literature
- US20150029485A1 SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER Public/Granted day:2015-01-29
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