发明授权
US09523911B2 Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound 有权
辐射敏感树脂组合物,抗蚀剂图案形成方法,酸发生剂和化合物

Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound
摘要:
The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3−, wherein a hydrogen atom or an electron-donating group bonds to an α carbon atom with respect to SO3−, and an electron-withdrawing group bonds to a β carbon atom with respect to SO3−; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R1 and R2 each independently represent a hydrogen atom or a monovalent electron-donating group. R3 represent a monovalent electron-withdrawing group. R4 represents a hydrogen atom or a monovalent hydrocarbon group.
信息查询
0/0