发明授权
US09523911B2 Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound
有权
辐射敏感树脂组合物,抗蚀剂图案形成方法,酸发生剂和化合物
- 专利标题: Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound
- 专利标题(中): 辐射敏感树脂组合物,抗蚀剂图案形成方法,酸发生剂和化合物
-
申请号: US14282270申请日: 2014-05-20
-
公开(公告)号: US09523911B2公开(公告)日: 2016-12-20
- 发明人: Hiroshi Tomioka , Takakazu Kimoto , Yusuke Asano
- 申请人: JSR CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: JSR CORPORATION
- 当前专利权人: JSR CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2013-106643 20130520; JP2014-099950 20140513
- 主分类号: C07C25/18
- IPC分类号: C07C25/18 ; C07C381/12 ; C07C309/04 ; G03F7/039 ; G03F7/004 ; C07C309/17 ; G03F7/11 ; G03F7/20
摘要:
The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3−, wherein a hydrogen atom or an electron-donating group bonds to an α carbon atom with respect to SO3−, and an electron-withdrawing group bonds to a β carbon atom with respect to SO3−; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R1 and R2 each independently represent a hydrogen atom or a monovalent electron-donating group. R3 represent a monovalent electron-withdrawing group. R4 represents a hydrogen atom or a monovalent hydrocarbon group.
公开/授权文献
信息查询