Invention Grant
- Patent Title: 193nm laser and inspection system
- Patent Title (中): 193nm激光和检查系统
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Application No.: US14170384Application Date: 2014-01-31
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Publication No.: US09529182B2Publication Date: 2016-12-27
- Inventor: Yung-Ho Chuang , J. Joseph Armstrong , Yujun Deng , Justin Dianhuan Liou , Vladimir Dribinski , John Fielden
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA—Tencor Corporation
- Current Assignee: KLA—Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Bever, Hoffman & Harms, LLP
- Main IPC: G01N21/95
- IPC: G01N21/95 ; H01S3/00 ; H01S3/23 ; G02B17/08

Abstract:
An improved solid-state laser for generating sub-200 nm light is described. This laser uses a fundamental wavelength between about 1030 nm and 1065 nm to generate the sub-200 nm light. The final frequency conversion stage of the laser creates the sub-200 nm light by mixing a wavelength of approximately 1109 nm with a wavelength of approximately 234 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.
Public/Granted literature
- US20140226140A1 193nm Laser And Inspection System Public/Granted day:2014-08-14
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