Invention Grant
- Patent Title: Energy-sensitive resin composition
- Patent Title (中): 能量敏感树脂组合物
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Application No.: US14758199Application Date: 2013-12-25
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Publication No.: US09529258B2Publication Date: 2016-12-27
- Inventor: Kunihiro Noda , Hiroki Chisaka , Dai Shiota , Kazuya Someya
- Applicant: TOKYO OHKA KOGYO CO., LTD.
- Applicant Address: JP Kawasaki-Shi
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2012-288708 20121228
- International Application: PCT/JP2013/084649 WO 20131225
- International Announcement: WO2014/104090 WO 20140703
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/40 ; C07D233/60 ; C07C323/47 ; C07D209/86 ; C08K5/33 ; G03F7/038 ; C09D179/08 ; C08G73/10 ; C07D233/56 ; C08K5/34

Abstract:
The present invention provides an energy-sensitive resin composition, a method of manufacturing a polyimide film or a polyimide molded product in which said composition is used, and a method of forming a pattern in which said composition is used. The composition supplies a polyimide resin exhibiting exceptional thermal resistance and low permittivity even by a heat treatment at a low temperature. The composition contains polyamic acid obtained by reacting tetracarboxylic dianhydride and diamine, a solvent, and a compound (A) decomposing by the action of light and/or heat and generating a base and/or an acid. The method of manufacturing a polyimide film or a polyimide molded product includes forming a coating film or molded product comprising the composition and decomposing the compound (A) in the film or product through exposure or heating. The method of forming a pattern sequentially includes forming, selectively exposing, developing and heating the film or product.
Public/Granted literature
- US20150338734A1 ENERGY-SENSITIVE RESIN COMPOSITION Public/Granted day:2015-11-26
Information query
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