Invention Grant
- Patent Title: Stage apparatus for semiconductor inspection and lithography systems
- Patent Title (中): 半导体检测和光刻系统的舞台装置
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Application No.: US14559398Application Date: 2014-12-03
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Publication No.: US09529280B2Publication Date: 2016-12-27
- Inventor: Aviv Balan
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Kwan & Olynick LLP
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/42 ; G03F7/20

Abstract:
A semiconductor sample is received on a chuck of a stage that is movable with respect to a stage frame. The stage, chuck, and sample are moved under an inspection or exposure head for inspecting or exposing the sample, and multiple 2D encoder heads are coupled with the chuck. Multiple 2D encoder scales are coupled with a base through which the head is inserted, and a stage encoder is positioned on the stage frame. Movement of the stage, chuck, and sample is controlled based on a position detected by at least one of the 2D encoder heads until a predefined position that is within a gap that is not covered by the 2D encoder scales is reached. Movement control of the stage, chuck, and sample is switched to being based on a position detected by the stage encoder when such predefined position that is within the gap is reached.
Public/Granted literature
- US20150160564A1 STAGE APPARATUS FOR SEMICONDUCTOR INSPECTION AND LITHOGRAPHY SYSTEMS Public/Granted day:2015-06-11
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