发明授权
- 专利标题： Radiation source, lithographic apparatus, and device manufacturing method
- 专利标题（中）： 辐射源，光刻设备和器件制造方法
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申请号： US13058783申请日： 2009-07-29
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公开(公告)号： US09529283B2公开(公告)日： 2016-12-27
- 发明人: Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Aizikovitch Sjmaenok
- 申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Aizikovitch Sjmaenok
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 国际申请： PCT/EP2009/005488 WO 20090729
- 国际公布： WO2010/017890 WO 20100218
- 主分类号： G21K5/04
- IPC分类号： G21K5/04 ; G03F7/20 ; B82Y10/00 ; G02B5/20 ; G21K1/06 ; G21K1/10
摘要：
A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.