公开(公告)号：US09529283B2

公开(公告)日：2016-12-27

申请号：US13058783

申请日：2009-07-29

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok

IPC分类号： G21K5/04 ,  G03F7/20 ,  B82Y10/00 ,  G02B5/20 ,  G21K1/06 ,  G21K1/10

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G02B5/208 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70941 ,  G21K1/062 ,  G21K1/10

摘要： A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.

摘要翻译： 光谱纯度滤光器被配置为透射极紫外（EUV）辐射并偏转或吸收非EUV次级辐射。 在一个实施例中，光谱纯度滤光器包括高度透射EUV辐射的材料体和高度反射位于身体辐射入射侧的非EUV次级辐射的材料层。 在一个实施例中，光谱纯度滤光器包括在EUV辐射高度透射的材料体和在身体端部上的高发射率材料层。

公开(公告)号：US20110143269A1

公开(公告)日：2011-06-16

申请号：US13058783

申请日：2009-07-29

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok

IPC分类号： G03F7/20 ,  H05G2/00 ,  G03B27/54 ,  G03F1/00

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G02B5/208 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70941 ,  G21K1/062 ,  G21K1/10

摘要： A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.

摘要翻译： 光谱纯度滤光器被配置为透射极紫外（EUV）辐射并偏转或吸收非EUV次级辐射。 在一个实施例中，光谱纯度滤光器包括高度透射EUV辐射的材料体和高度反射位于身体辐射入射侧的非EUV次级辐射的材料层。 在一个实施例中，光谱纯度滤光器包括在EUV辐射高度透射的材料体和在身体端部上的高发射率材料层。

公开(公告)号：US09897930B2

公开(公告)日：2018-02-20

申请号：US13057583

申请日：2009-07-22

申请人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Denis Alexandrovich Glushkov ,  Andrei Mikhailovich Yakunin

发明人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Denis Alexandrovich Glushkov ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20

CPC分类号： G03F7/70958 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G03F7/70916

摘要： A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.

公开(公告)号：US20110080573A1

公开(公告)日：2011-04-07

申请号：US12996036

申请日：2009-05-20

申请人： Denis Alexandrovich Glushkov ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok ,  Nikolai Nikolaevich Salaschenko

发明人： Denis Alexandrovich Glushkov ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok ,  Nikolai Nikolaevich Salaschenko

IPC分类号： G03B27/72 ,  G02B5/28

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F1/24 ,  G21K1/062 ,  G21K2201/067

摘要： A multilayer mirror is constructed and arranged to reflect radiation haying a wavelength in the range of 2-8 nm. The multilayer mirror has alternating layers selected from the group consisting of: Cr and Sc layers, Cr and C layers, C and B4C layers, U and B4C layers, Th and B4C layers, C and B9C layers, La and B9C layers, U and B9C layers, Th and B9C layers, La and B layers, C and B layers. U and B layers, and Th and B layers.

摘要翻译： 构造和布置多层反射镜以反射辐射范围为2-8nm的辐射。 多层反射镜具有选自Cr和Sc层，Cr和C层，C和B4C层，U和B4C层，Th和B4C层，C和B9C层，La和B9C层，U和 B9C层，Th和B9C层，La和B层，C和B层。 U和B层，以及Th和B层。

公开(公告)号：US09285690B2

公开(公告)日：2016-03-15

申请号：US13002854

申请日：2009-07-16

申请人： Vadim Yevgenyevich Banine ,  Leonid Aizikovitch Sjmaenok ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Leonid Aizikovitch Sjmaenok ,  Andrei Mikhailovich Yakunin

IPC分类号： G03B27/54 ,  G03F7/20 ,  B82Y10/00 ,  G21K1/06

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F7/70575 ,  G21K1/062

摘要： Embodiments of the invention relate to a mirror (30). The mirror includes a mirroring surface and a profiled coating layer (32a) having an outer surface, wherein one or more wedged elements are formed by the outer surface with respect to the mirroring surface, and wherein the one or more wedged elements having a wedge angle (ø) in a range of approximately 10-200 mrad. The profiled coating layer may have a curved outer surface. The profiled coating layer may be formed from at least one of the following materials: Be, B, C, P, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Ru, Nb, Mo, Ba, La, Ce, Pr, Pa and U.

摘要翻译： 本发明的实施例涉及一种反射镜（30）。 反射镜包括镜面和具有外表面的成型涂层（32a），其中一个或多个楔形元件相对于镜面由外表面形成，并且其中一个或多个楔形元件具有楔角 （ø）在约10-200 mrad的范围内。 成型涂层可以具有弯曲的外表面。 成型涂层可以由以下材料中的至少一种形成：Be，B，C，P，K，Ca，Sc，Br，Rb，Sr，Y，Zr，Ru，Nb，Mo，Ba，La， Ce，Pr，Pa和U.

公开(公告)号：US20110228243A1

公开(公告)日：2011-09-22

申请号：US13002854

申请日：2009-07-16

申请人： Vadim Yevgenyevich Banine ,  Leonid Aizikovitch Sjmaenok ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Leonid Aizikovitch Sjmaenok ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  G03B27/52 ,  G02B7/182 ,  G02B5/10

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F7/70575 ,  G21K1/062

摘要： Embodiments of the invention relate to a mirror (30). The mirror includes a mirroring surface and a profiled coating layer (32a) having an outer surface, wherein one or more wedged elements are formed by the outer surface with respect to the mirroring surface, and wherein the one or more wedged elements having a wedge angle (ø) in a range of approximately 10-200 mrad. The profiled coating layer may have a curved outer surface. The profiled coating layer may be formed from at least one of the following materials: Be, B, C, P, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Ru, Nb, Mo, Ba, La, Ce, Pr, Pa and U.

摘要翻译： 本发明的实施例涉及一种反射镜（30）。 反射镜包括镜面和具有外表面的成型涂层（32a），其中一个或多个楔形元件相对于镜面由外表面形成，并且其中一个或多个楔形元件具有楔角 （ø）在约10-200 mrad的范围内。 成型涂层可以具有弯曲的外表面。 成形涂层可以由以下材料中的至少一种形成：Be，B，C，P，K，Ca，Sc，Br，Rb，Sr，Y，Zr，Ru，Nb，Mo，Ba，La， Ce，Pr，Pa和U.

公开(公告)号：US20110249243A1

公开(公告)日：2011-10-13

申请号：US13057583

申请日：2009-07-22

申请人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus josephine Moors ,  Debis Alexandrovich Glushkov ,  Andrei Mikhailovich Yakunin

发明人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus josephine Moors ,  Debis Alexandrovich Glushkov ,  Andrei Mikhailovich Yakunin

IPC分类号： G03B27/00 ,  B05D5/06 ,  G02B5/08

CPC分类号： G03F7/70958 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G03F7/70916

摘要： A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.

摘要翻译： 光刻设备包括包括定向碳纳米管片的光学元件。 光学元件具有在约20-500nm范围内的元件厚度，并且在与EUV辐射的垂直照射下具有至少约20％的波长在约1-20nm范围内的EUV辐射的透射。

公开(公告)号：US07612353B2

公开(公告)日：2009-11-03

申请号：US11481252

申请日：2006-07-06

申请人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van Den Wildenberg ,  Alexander Alexandrovitch Schmidt ,  Arnoud Cornelis Wassink ,  Eric Louis Willem Verpalen ,  Antonius Johannes Van De Pas ,  Paul Peter Anna Antonius Brom

发明人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van Den Wildenberg ,  Alexander Alexandrovitch Schmidt ,  Arnoud Cornelis Wassink ,  Eric Louis Willem Verpalen ,  Antonius Johannes Van De Pas ,  Paul Peter Anna Antonius Brom

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

摘要翻译： 光刻设备包括包括用于产生辐射束的辐射源的辐射系统和布置在辐射束的路径中的污染物阱。 污染物捕集器包括限定通道的多个箔或板，其基本上平行于所述辐射束的传播方向布置。 箔或板可以相对于辐射束的光轴基本上径向定向。 污染物阱可以设置有气体注射器，其被配置为至少在两个不同位置将气体喷射到污染物阱的至少一个通道中。

公开(公告)号：US20110292366A1

公开(公告)日：2011-12-01

申请号：US13201242

申请日：2010-01-11

申请人： Denis Alexandrovich Glushkov ,  Vadim Yevgenyevich Banine ,  Leonid Aizikovitch Sjmaenok ,  Nikolay Nikolaevitch Salashchenko ,  Nikolay Ivanovich Chkhalo

发明人： Denis Alexandrovich Glushkov ,  Vadim Yevgenyevich Banine ,  Leonid Aizikovitch Sjmaenok ,  Nikolay Nikolaevitch Salashchenko ,  Nikolay Ivanovich Chkhalo

IPC分类号： G03B27/54 ,  G02B5/08

CPC分类号： G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/085 ,  G02B5/0891 ,  G03F1/24 ,  G03F7/70316 ,  G03F7/70941 ,  G03F7/70958

摘要： A multilayer mirror to reflect radiation having a wavelength in the range of 2-8 nm has alternating layers. The alternating layers include a first layer and a second layer. The first and second layers are selected from the group consisting of: U and B4C layers, Th and B4C layers, La and B9C layers, La and B4C layers, U and B9C layers, Th and B9C layers, La and B layers, U and B layers, C and B layers, Th and B layers, U compound and B4C layers, Th compound and B4C layers, La compound and B9C layers, La compound and B4C layers, U compound and a B9C layers, Th compound and a B9C layers, La compound and a B layers, U compound and B layers, and Th compound and a B layers. An interlayer is disposed between at least one of the first layers and the second layer.

摘要翻译： 用于反射波长在2-8nm范围内的辐射的多层反射镜具有交替层。 交替层包括第一层和第二层。 第一层和第二层选自：U和B4C层，Th和B4C层，La和B9C层，La和B4C层，U和B9C层，Th和B9C层，La和B层，U和 B层，C层和B层，Th和B层，U化合物和B4C层，Th化合物和B4C层，La化合物和B9C层，La化合物和B4C层，U化合物和B9C层，Th化合物和B9C层 ，La化合物和B层，U化合物和B层，以及Th化合物和B层。 中间层设置在第一层和第二层中的至少一个之间。

公开(公告)号：US09448492B2

公开(公告)日：2016-09-20

申请号：US14126326

申请日：2012-03-26

申请人： Andrei Mikhailovich Yakunin ,  Denis Alexandrovich Glushkov ,  Vladimir Nikolaevich Polkovnikov ,  Nikolay Nikolaevitch Salashchenko ,  Leonid Aizikovitch Sjmaenok

发明人： Andrei Mikhailovich Yakunin ,  Denis Alexandrovich Glushkov ,  Vladimir Nikolaevich Polkovnikov ,  Nikolay Nikolaevitch Salashchenko ,  Leonid Aizikovitch Sjmaenok

IPC分类号： G03B27/54 ,  G03F7/20 ,  G02B5/08 ,  G21K1/06 ,  B82Y10/00

CPC分类号： G03F7/702 ,  B82Y10/00 ,  G02B5/0816 ,  G02B5/0875 ,  G02B5/0891 ,  G03F7/70866 ,  G03F7/70883 ,  G21K1/062 ,  G21K2201/061

摘要： A multilayer mirror for use in device lithography is configured to reflect and/or pattern radiation having a wavelength in the range of about 6.4 nm to about 7.2 nm. The multilayer mirror has a plurality of alternating layers of materials. The plurality of alternating layers of materials include first layers of materials and second layers of materials. The second layers have a higher refractive index for the radiation than the first layers. The materials of the first layers and the materials of the second layers are mutually chemically unreactive at an interface therebetween at temperatures less than 300° C. This may allow the mirrors to have a narrow boundary region of intermingled materials from alternating layers between the layers, for example of 0.5 nm or less in width, which may improve sharpness of the boundary region and improve reflectivity.

摘要翻译： 用于器件光刻的多层反射镜被配置为反射和/或形成具有在约6.4nm至约7.2nm范围内的波长的辐射。 多层反射镜具有多个交替的材料层。 多个交替的材料层包括第一层材料和第二层材料。 第二层对于辐射具有比第一层更高的折射率。 第一层的材料和第二层的材料在低于300℃的温度下在其界面处相互化学反应。这可以允许反射镜具有与层之间的交替层的混合材料的窄边界区域， 例如0.5nm以下的宽度，这可以提高边界区域的清晰度并提高反射率。