Invention Grant
- Patent Title: Frequency multiplier based on a low dimensional semiconductor structure
- Patent Title (中): 基于低维半导体结构的倍频器
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Application No.: US14767301Application Date: 2014-03-25
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Publication No.: US09530845B2Publication Date: 2016-12-27
- Inventor: Kunyuan Xu
- Applicant: SOUTH CHINA NORMAL UNIVERSITY
- Applicant Address: CN
- Assignee: SOUTH CHINA NORMAL UNIVERSITY
- Current Assignee: SOUTH CHINA NORMAL UNIVERSITY
- Current Assignee Address: CN
- Agency: Schmeiser, Olsen & Watts, LLP
- Priority: CN201310144245 20130423
- International Application: PCT/CN2014/073996 WO 20140325
- International Announcement: WO2014/173218 WO 20141030
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/20 ; H03B19/14 ; H01L29/778

Abstract:
A frequency multiplier based on a low dimensional semiconductor structure, including an insulating substrate layer, a semiconductor conducting layer arranged on the surface of the insulating substrate layer, an insulating protective layer arranged on the surface of the semiconductor conducting layer, an insulating carving groove penetrating the semiconductor conducting layer, an inlet electrode arranged on the side surface of the semiconductor conducting layer, and an outlet electrode arranged on the side surface corresponding to the access electrode is provided. The semiconductor conducting layer comprises two two-dimensional, quasi-one-dimensional, or one-dimensional current carrying channels near to and parallel to each other. The frequency multiplier has advantages that the structure is simple, the process is easy to implement, no extra filter circuit needs to be added, dependence on material characteristics is little, and the selection range of materials is wide.
Public/Granted literature
- US20160035837A1 FREQUENCY MULTIPLIER BASED ON A LOW DIMENSIONAL SEMICONDUCTOR STRUCTURE Public/Granted day:2016-02-04
Information query
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