Invention Grant
- Patent Title: Magnetic tunnel junctions
- Patent Title (中): 磁隧道结
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Application No.: US14687280Application Date: 2015-04-15
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Publication No.: US09530959B2Publication Date: 2016-12-27
- Inventor: Manzar Siddik , Witold Kula , Gurtej S. Sandhu
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John, P.S.
- Main IPC: H01L43/08
- IPC: H01L43/08 ; G11B5/39 ; H01L43/10

Abstract:
A method of forming a magnetic electrode of a magnetic tunnel junction comprises forming non-magnetic MgO-comprising material over conductive material of the magnetic electrode being formed. An amorphous metal is formed over the MgO-comprising material. Amorphous magnetic electrode material comprising Co and Fe is formed over the amorphous metal. The amorphous magnetic electrode material is devoid of B. Non-magnetic tunnel insulator material comprising MgO is formed directly against the amorphous magnetic electrode material. The tunnel insulator material is devoid of B. After forming the tunnel insulator material, the amorphous Co and Fe-comprising magnetic electrode material is annealed at a temperature of at least about 250° C. to form crystalline Co and Fe-comprising magnetic electrode material from an MgO-comprising surface of the tunnel insulator material. The crystalline Co and Fe-comprising magnetic electrode material is devoid of B. Other method and non-method embodiments are disclosed.
Public/Granted literature
- US20160308122A1 MAGNETIC TUNNEL JUNCTIONS Public/Granted day:2016-10-20
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