Invention Grant
US09541833B2 Polyether compound, method for preparing same and photoresist composition
有权
聚醚化合物，其制备方法和光致抗蚀剂组合物
- Patent Title: Polyether compound, method for preparing same and photoresist composition
- Patent Title (中): 聚醚化合物，其制备方法和光致抗蚀剂组合物
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Application No.: US14366382Application Date: 2013-11-25
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Publication No.: US09541833B2Publication Date: 2017-01-10
- Inventor: Xuelan Wang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Collard & Roe, P.C.
- Priority: CN201310363403 20130820
- International Application: PCT/CN2013/087790 WO 20131125
- International Announcement: WO2015/024316 WO 20150226
- Main IPC: G03F7/032
- IPC: G03F7/032 ; G03F7/027 ; G03F7/11 ; G03F7/004 ; C08G65/332 ; C07C15/50 ; C07C15/54 ; C08G65/48 ; G03F7/09 ; G03F7/00 ; G02B5/20 ; H01L21/027
Abstract:
A polyether compound which is as shown in Formula (I), wherein R1 is a polyether backbone of the polyether polyol; R2 is hydrogen or C1˜C5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage.
Public/Granted literature
- US20160154305A1 POLYETHER COMPOUND, METHOD FOR PREPARING SAME AND PHOTORESIST COMPOSITION Public/Granted day:2016-06-02
Information query
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