Invention Grant
US09543253B2 Method for shaping a laminate substrate 有权
层压基板成型方法

Method for shaping a laminate substrate
Abstract:
A method including providing a laminate substrate, characterizing the laminate substrate for warpage characteristics, determining a horizontal plane distortion based on the warpage characteristics, and placing the laminate substrate into a fixture with an adjustment to correct the horizontal plane distortion, the adjustment being located in a center of the laminate substrate, wherein the adjustment contacts the laminate substrate. The method may further include fluxing the laminate substrate, placing a chip onto the laminate substrate, and placing the fixture into a reflow furnace to join the chip and the laminate substrate.
Public/Granted literature
Information query
Patent Agency Ranking
0/0