Invention Grant
- Patent Title: Method for shaping a laminate substrate
- Patent Title (中): 层压基板成型方法
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Application No.: US14598258Application Date: 2015-01-16
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Publication No.: US09543253B2Publication Date: 2017-01-10
- Inventor: Edmund Blackshear , Thomas E. Lombardi , Donald A. Merte , Steven P. Ostrander , Thomas Weiss , Jiantao Zheng
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- Agent George Blasiak
- Main IPC: B23K1/00
- IPC: B23K1/00 ; B23K1/20 ; B23K31/00 ; B23K31/02 ; B23K37/04 ; H01L21/00 ; H01L23/00 ; H01L21/66 ; H01L21/673

Abstract:
A method including providing a laminate substrate, characterizing the laminate substrate for warpage characteristics, determining a horizontal plane distortion based on the warpage characteristics, and placing the laminate substrate into a fixture with an adjustment to correct the horizontal plane distortion, the adjustment being located in a center of the laminate substrate, wherein the adjustment contacts the laminate substrate. The method may further include fluxing the laminate substrate, placing a chip onto the laminate substrate, and placing the fixture into a reflow furnace to join the chip and the laminate substrate.
Public/Granted literature
- US20150136838A1 METHOD FOR SHAPING A LAMINATE SUBSTRATE Public/Granted day:2015-05-21
Information query
IPC分类: