Invention Grant
US09543258B2 Semiconductor device and method of forming holes in substrate to interconnect top shield and ground shield 有权
在衬底中形成孔以互连顶部屏蔽和接地屏蔽的半导体器件和方法

Semiconductor device and method of forming holes in substrate to interconnect top shield and ground shield
Abstract:
A semiconductor device includes a multi-layer substrate. A ground shield is disposed between layers of the substrate and electrically connected to a ground point. A plurality of semiconductor die is mounted to the substrate over the ground shield. The ground shield extends beyond a footprint of the plurality of semiconductor die. An encapsulant is formed over the plurality of semiconductor die and substrate. Dicing channels are formed in the encapsulant, between the plurality of semiconductor die, and over the ground shield. A plurality of metal-filled holes is formed along the dicing channels, and extends into the substrate and through the ground shield. A top shield is formed over the plurality of semiconductor die and electrically and mechanically connects to the ground shield through the metal-filled holes. The top and ground shields are configured to block electromagnetic interference generated with respect to an integrated passive device disposed in the semiconductor die.
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