Invention Grant
US09543258B2 Semiconductor device and method of forming holes in substrate to interconnect top shield and ground shield
有权
在衬底中形成孔以互连顶部屏蔽和接地屏蔽的半导体器件和方法
- Patent Title: Semiconductor device and method of forming holes in substrate to interconnect top shield and ground shield
- Patent Title (中): 在衬底中形成孔以互连顶部屏蔽和接地屏蔽的半导体器件和方法
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Application No.: US15011311Application Date: 2016-01-29
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Publication No.: US09543258B2Publication Date: 2017-01-10
- Inventor: OhHan Kim , SunMi Kim , KyungHoon Lee
- Applicant: STATS ChipPAC, Ltd.
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group: Atkins and Associates, P.C.
- Agent Robert D. Atkins
- Main IPC: H01L23/60
- IPC: H01L23/60 ; H01L21/56 ; H01L23/29 ; H01L23/31 ; H01L23/552 ; H01L23/00

Abstract:
A semiconductor device includes a multi-layer substrate. A ground shield is disposed between layers of the substrate and electrically connected to a ground point. A plurality of semiconductor die is mounted to the substrate over the ground shield. The ground shield extends beyond a footprint of the plurality of semiconductor die. An encapsulant is formed over the plurality of semiconductor die and substrate. Dicing channels are formed in the encapsulant, between the plurality of semiconductor die, and over the ground shield. A plurality of metal-filled holes is formed along the dicing channels, and extends into the substrate and through the ground shield. A top shield is formed over the plurality of semiconductor die and electrically and mechanically connects to the ground shield through the metal-filled holes. The top and ground shields are configured to block electromagnetic interference generated with respect to an integrated passive device disposed in the semiconductor die.
Public/Granted literature
Information query
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