Invention Grant
- Patent Title: Nozzle
- Patent Title (中): 喷嘴
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Application No.: US14169929Application Date: 2014-01-31
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Publication No.: US09544982B2Publication Date: 2017-01-10
- Inventor: Jian Zhao , Tetsuya Ishikawa
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Arent Fox LLP
- Main IPC: B05B1/00
- IPC: B05B1/00 ; H05G2/00 ; B05B1/02 ; F02M61/18 ; H01J49/16 ; B01D15/08 ; B41J2/16 ; B05B15/02
Abstract:
An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository including a nozzle with a radial trench design. The nozzle may be formed from a silicon-on-insulator wafer.
Public/Granted literature
- US20150223313A1 NOZZLE AND METHOD OF MAKING SAME Public/Granted day:2015-08-06
Information query
