发明授权
- 专利标题： Dual wafer stage switching system for a lithography machine
- 专利标题（中）： 用于光刻机的双晶片级切换系统
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申请号： US14009289申请日： 2012-03-23
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公开(公告)号： US09547245B2公开(公告)日： 2017-01-17
- 发明人: Yu Zhu , Yaying Chen , Ming Zhang , Dengfeng Xu , Jinsong Wang
- 申请人： Yu Zhu , Yaying Chen , Ming Zhang , Dengfeng Xu , Jinsong Wang
- 申请人地址： CN
- 专利权人： TSINGHUA UNIVERSITY
- 当前专利权人： TSINGHUA UNIVERSITY
- 当前专利权人地址： CN
- 代理机构： Hauptman Ham, LLP
- 优先权： CN201110082729 20110401
- 国际申请： PCT/CN2012/072974 WO 20120323
- 国际公布： WO2012/130108 WO 20121004
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; G03F7/20
摘要：
Disclosed is a dual wafer stage switching system for a lithography machine. The system comprises a base stage (30), a wafer stage (16.1) running at a pre-processing workstation, and a wafer stage (16.2) running at an exposure workstation. A rotating motor (41) is mounted under the base stage (30) for rotating the two wafer stages after the wafer stages have completed pre-processing and exposure operations in order to complete position switch of the wafer stages, wherein the base stage (30) is kept stationary during the switch. The present invention avoids rotation of a large inertia base stage and has low requirement for motor power, while eliminating a guide rail docking device and an auxiliary device and greatly simplifying system configuration. The system is easy and convenient to operate and easy to control.
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