发明授权
- 专利标题： Method for forming an oxide coated substrate
- 专利标题（中）： 用于形成氧化物涂覆的基材的方法
-
申请号： US14759610申请日： 2014-01-03
-
公开(公告)号： US09555406B2公开(公告)日： 2017-01-31
- 发明人: Ekambaram Sambandan , Rajesh Mukherjee , Takuya Fukumura , Amane Mochizuki
- 申请人： Nitto Denko Corporation
- 申请人地址： JP Osaka
- 专利权人： Nitto Denko Corporation
- 当前专利权人： Nitto Denko Corporation
- 当前专利权人地址： JP Osaka
- 代理机构： K&L Gates LLP
- 代理商 Louis C. Cullman; Brent A. Johnson
- 国际申请： PCT/US2014/010201 WO 20140103
- 国际公布： WO2014/107591 WO 20140710
- 主分类号： B01J37/08
- IPC分类号： B01J37/08 ; B01J37/12 ; C01G23/053 ; B01J37/02 ; B01J31/22 ; B01J27/25 ; B01J21/12 ; B01J35/00 ; C04B41/00 ; C04B41/50 ; C01B21/082 ; B01J21/06 ; B01J23/14 ; B01J27/24 ; C04B111/00
摘要：
A method for forming an oxide coated substrate comprising heating a pre-coating mixture in the presence of a substrate to synthesize an oxide coating on the substrate. The pre-coating mixture comprises a solubilized reducing additive, a solubilized oxidizing additive, and the substrate. The heating is conducted at a temperature sufficiently high enough to exothermically react the solubilized reducing additive and solubilized oxidizing additive and low enough to control the phase and composition of the oxide.
公开/授权文献
- US20150343434A1 Method for Forming an Oxide Coated Substrate 公开/授权日：2015-12-03
信息查询
