Invention Grant
- Patent Title: Semiconductor device and method of forming a fan-in package-on-package structure using through silicon vias
- Patent Title (中): 半导体器件和通过硅通孔形成扇入式封装封装结构的方法
-
Application No.: US12209838Application Date: 2008-09-12
-
Publication No.: US09559046B2Publication Date: 2017-01-31
- Inventor: Hyunil Bae , Youngchul Kim , Myungkil Lee
- Applicant: Hyunil Bae , Youngchul Kim , Myungkil Lee
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group: Atkins and Associates, P.C.
- Agent Robert D. Atkins
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/498 ; H01L21/56 ; H01L23/48 ; H01L25/065 ; H01L25/10 ; H01L25/00 ; H01L25/03 ; H01L23/31 ; H01L23/525 ; H01L23/00

Abstract:
A semiconductor device is made by providing a first semiconductor die having a plurality of contact pads formed over a first surface of the first semiconductor die and having a plurality of through-silicon vias (TSVs) formed within the first semiconductor die. A second semiconductor die is mounted to the first surface of the first semiconductor die using a plurality of solder bumps. At least one of the solder bumps is in electrical communication with the TSVs in the first semiconductor die. The second semiconductor die is mounted to a printed circuit board (PCB) using an adhesive material. A plurality of solder bumps is formed to connect the contact pads of the first semiconductor die to the PCB. An encapsulant is deposited over the first semiconductor die and the second semiconductor die. An interconnect structure is formed over a back surface of the PCB.
Public/Granted literature
Information query
IPC分类: