Invention Grant
US09563121B2 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition
有权
光化射线敏感或辐射敏感性树脂组合物，以及光化射线敏感或辐射敏感膜和图案形成方法，每种使用组合物
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition
- Patent Title (中): 光化射线敏感或辐射敏感性树脂组合物，以及光化射线敏感或辐射敏感膜和图案形成方法，每种使用组合物
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Application No.: US14452093Application Date: 2014-08-05
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Publication No.: US09563121B2Publication Date: 2017-02-07
- Inventor: Takeshi Inasaki , Takeshi Kawabata , Tomotaka Tsuchimura , Toru Tsuchihashi
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2012-048562 20120305
- Main IPC: C08F212/12
- IPC: C08F212/12 ; G03F7/039 ; G03F7/20 ; G03F7/038 ; C08F212/14 ; C08F12/22 ; C08F12/24 ; C08F8/02 ; C09D125/18 ; G03F1/00 ; G03F7/00 ; C08F261/02 ; C08F12/30
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group has been substituted with a group represented by the following General Formula (1) (in the formula, M11 represents a single bond or a divalent linking group; Q11 represents an alkyl group, a cycloalkyl group, or an aryl group).
Public/Granted literature
Information query
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