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US09563131B2 Lithographic apparatus, substrate and device manufacturing method 有权
平版印刷设备,基板和器件制造方法

Lithographic apparatus, substrate and device manufacturing method
Abstract:
A method uses a lithographic apparatus to form an inspection target structure upon a substrate. The method comprises forming the periphery of the inspection target structure so as to provide a progressive optical contrast transition between the inspection target structure and its surrounding environment. This may be achieved by providing a progressive change in the optical index at the periphery of the target structure.
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