发明授权
- 专利标题： Composite protective layer for photoelectrode structure, photoelectrode structure including the composite protective layer, and photoelectrochemical cell including photoelectrode structure
- 专利标题（中）： 光电极结构复合保护层，复合保护层光电结构，光电结构光电化学电池
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申请号： US14143271申请日： 2013-12-30
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公开(公告)号： US09567680B2公开(公告)日： 2017-02-14
- 发明人: Tae-gon Kim , Jeong-hee Lee , Seoung-jae Im , Tae-hyung Kim
- 申请人： Samsung Electronics Co., Ltd.
- 申请人地址： KR Gyeonggi-Do
- 专利权人： SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人： SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址： KR Gyeonggi-Do
- 代理机构： Cantor Colburn LLP
- 优先权： KR10-2013-0010097 20130129
- 主分类号： C25B11/04
- IPC分类号： C25B11/04 ; C01B3/04 ; C25B1/00
摘要：
A composite protective layer for a photoelectrode, the composite protective layer including a chemical protective layer; and a physical protective layer, wherein the chemical protective layer has corrosion rate of 0.1 Coulombs per square centimeter per 10 hours or less when evaluated at a water decomposition potential, and the physical protective layer has a moisture transmittance rate of 0.001 grams per square meter per day or less and has an electrical conductivity.
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