发明授权
US09568824B2 Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith
有权
光化学射线或辐射敏感性树脂组合物，抗蚀剂膜及其形成图案的方法
- 专利标题： Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith
- 专利标题（中）： 光化学射线或辐射敏感性树脂组合物，抗蚀剂膜及其形成图案的方法
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申请号： US13193235申请日： 2011-07-28
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公开(公告)号： US09568824B2公开(公告)日： 2017-02-14
- 发明人: Toshiya Takahashi , Hideaki Tsubaki , Hiroshi Tamaoki , Hidenori Takahashi
- 申请人： Toshiya Takahashi , Hideaki Tsubaki , Hiroshi Tamaoki , Hidenori Takahashi
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2010-171085 20100729
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; G03F7/004 ; G03F7/075 ; G03F7/20 ; G03F7/30 ; G03F7/32
摘要：
Provided is an actinic-ray- or radiation-sensitive resin composition, includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) with a structure that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and a compound (U) structured so that when the composition is formed into a film, the compound is unevenly distributed in a surface of the film.
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