Invention Grant
- Patent Title: High hydroxyl TiO2-SiO2 glass
- Patent Title (中): 高羟基TiO2-SiO2玻璃
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Application No.: US14921487Application Date: 2015-10-23
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Publication No.: US09580350B2Publication Date: 2017-02-28
- Inventor: Sezhian Annamalai , Carlos Alberto Duran , Kenneth Edward Hrdina
- Applicant: Corning Incorporated
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Kevin L. Bray
- Main IPC: C03C3/06
- IPC: C03C3/06 ; C03C3/076 ; C03C10/00 ; C03B19/14 ; C03B19/06 ; C03B19/12 ; C03B32/00

Abstract:
Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (Tf), and low expansivity slope.
Public/Granted literature
- US20160137545A1 HIGH HYDROXYL TIO2-SIO2 GLASS Public/Granted day:2016-05-19
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