Invention Grant
- Patent Title: Via structure for signal equalization
- Patent Title (中): 通道结构用于信号均衡
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Application No.: US14206756Application Date: 2014-03-12
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Publication No.: US09583417B2Publication Date: 2017-02-28
- Inventor: Zhuowen Sun , Cyprian Emeka Uzoh , Yong Chen
- Applicant: Invensas Corporation
- Applicant Address: US CA San Jose
- Assignee: Invensas Corporation
- Current Assignee: Invensas Corporation
- Current Assignee Address: US CA San Jose
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/532 ; H01L23/498

Abstract:
An apparatus relating generally to a substrate is disclosed. In such an apparatus, the substrate has a first surface and a second surface opposite the first surface. The first surface and the second surface define a thickness of the substrate. A via structure extends from the first surface of the substrate to the second surface of the substrate. The via structure has a first terminal at or proximate to the first surface and a second terminal at or proximate to the second surface provided by a conductive member of the via structure extending from the first terminal to the second terminal. A barrier layer of the via structure is disposed between at least a portion of the conductive member and the substrate. The barrier layer has a conductivity configured to offset a capacitance between the conductive member and the substrate when a signal is passed through the conductive member of the via structure.
Public/Granted literature
- US20150262910A1 VIA STRUCTURE FOR SIGNAL EQUALIZATION Public/Granted day:2015-09-17
Information query
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