发明授权
- 专利标题： Method for manufacturing acoustic wave device
- 专利标题（中）： 制造声波装置的方法
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申请号： US13644040申请日： 2012-10-03
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公开(公告)号： US09584088B2公开(公告)日： 2017-02-28
- 发明人: Taku Kikuchi , Hideaki Takahashi
- 申请人： Murata Manufacturing Co., Ltd.
- 申请人地址： JP Kyoto
- 专利权人： Murata Manufacturing Co., Ltd.
- 当前专利权人： Murata Manufacturing Co., Ltd.
- 当前专利权人地址： JP Kyoto
- 代理机构： Keating & Bennett, LLP
- 优先权： JP2011-057377 20110316
- 主分类号： H03H3/02
- IPC分类号： H03H3/02 ; H03H9/02 ; C23C14/34 ; H03H3/10 ; H03H3/00 ; H03H9/00 ; H03H9/145 ; C23C14/00 ; H03H3/04 ; H03H9/72
摘要：
A method for manufacturing an acoustic wave device with an excellent frequency-temperature profile is performed such that the acoustic wave device produced includes a piezoelectric substrate, an IDT electrode located on the piezoelectric substrate, and a dielectric film mainly including Si and O and arranged on the piezoelectric substrate to cover the IDT electrode. The dielectric film is formed by sputtering in a sputtering gas containing H2O.
公开/授权文献
- US20130029033A1 METHOD FOR MANUFACTURING ACOUSTIC WAVE DEVICE 公开/授权日：2013-01-31
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