Invention Grant
US09587136B2 Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography
有权
具有高Flory-Huggins嵌段共聚物光刻相互作用参数的嵌段共聚物
- Patent Title: Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography
- Patent Title (中): 具有高Flory-Huggins嵌段共聚物光刻相互作用参数的嵌段共聚物
-
Application No.: US14048766Application Date: 2013-10-08
-
Publication No.: US09587136B2Publication Date: 2017-03-07
- Inventor: Padma Gopalan , Daniel Patrick Sweat , Xiang Yu , Myungwoong Kim
- Applicant: Wisconsin Alumni Research Foundation
- Applicant Address: US WI Madison
- Assignee: Wisconsin Alumni Research Foundation
- Current Assignee: Wisconsin Alumni Research Foundation
- Current Assignee Address: US WI Madison
- Agency: Bell & Manning, LLC
- Main IPC: C09D153/00
- IPC: C09D153/00 ; C08F12/32 ; C08F12/22 ; C08F297/02 ; G03F7/00
Abstract:
Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (χ). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.
Public/Granted literature
- US20150099109A1 BLOCK COPOLYMERS WITH HIGH FLORY-HUGGINS INTERACTION PARAMETERS FOR BLOCK COPOLYMER LITHOGRAPHY Public/Granted day:2015-04-09
Information query
IPC分类:
