- Patent Title: Current-perpendicular-to-plane magneto-resistance effect element
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Application No.: US15339094Application Date: 2016-10-31
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Publication No.: US09589583B1Publication Date: 2017-03-07
- Inventor: Ye Du , Takao Furubayashi , Yukiko Takahashi , Kazuhiro Hono
- Applicant: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Applicant Address: JP Ibaraki
- Assignee: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Current Assignee: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Current Assignee Address: JP Ibaraki
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2013-079344 20130405
- Main IPC: G11B5/39
- IPC: G11B5/39

Abstract:
The CPPGMR element of the present invention has an orientation layer 12 formed on a substrate 11 to texture a Heusler alloy into a (100) direction, an underlying layer 13 that is an electrode for magneto-resistance measurement stacked on the orientation layer 12, a lower ferromagnetic layer 14 and an upper ferromagnetic layer 16 each stacked on the underlying layer 13 and made of a Heusler alloy, a spacer layer 15 sandwiched between the lower ferromagnetic layers 14 and the upper ferromagnetic layers 16, and a cap layer 17 stacked on the upper ferromagnetic layer 16 for surface-protection. This manner makes it possible to provide, inexpensively, an element using a current-perpendicular-to-plane giant magneto-resistance effect (CPPGMR) of a thin film having a trilayered structure of a ferromagnetic metal/a nonmagnetic metal/a ferromagnetic metal, thereby showing excellent performances.
Public/Granted literature
- US20170092307A1 CURRENT-PERPENDICULAR-TO-PLANE MAGNETO-RESISTANCE EFFECT ELEMENT Public/Granted day:2017-03-30
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