Invention Grant
US09589982B1 Structure and method of operation for improved gate capacity for 3D NOR flash memory
有权
3D NOR闪存存储器的栅极容量提高的结构和操作方法
- Patent Title: Structure and method of operation for improved gate capacity for 3D NOR flash memory
- Patent Title (中): 3D NOR闪存存储器的栅极容量提高的结构和操作方法
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Application No.: US14854383Application Date: 2015-09-15
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Publication No.: US09589982B1Publication Date: 2017-03-07
- Inventor: Cheng-Hsien Cheng , Chih-Wei Lee , Shaw-Hung Ku , Wen-Pin Lu
- Applicant: MACRONIX INTERNATIONAL CO., LTD.
- Applicant Address: TW Hsin-Chu
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW Hsin-Chu
- Agency: Alston & Bird LLP
- Main IPC: H01L29/792
- IPC: H01L29/792 ; H01L27/115

Abstract:
Embodiments of the present invention provide improved three-dimensional memory cells, arrays, devices, and/or the like and associated methods. In one embodiment, a three-dimensional memory cell is provided. The three-dimensional memory cell comprises a first conductive layer; a third conductive layer spaced apart from the first conductive layer; a channel conductive layer connecting the first conductive layer and the third conductive layer to form an opening having internal surfaces; a dielectric layer disposed along the internal surfaces of the opening surrounded by the first conductive layer, the channel conductive layer and the third conductive layer; and a second conductive layer interposed and substantially filling a remaining open portion formed by the dielectric layer. The first conductive layer, the dielectric layer, and the second conductive layer are configured to form a staircase structure.
Public/Granted literature
- US20170077118A1 STRUCTURE AND METHOD OF OPERATION FOR IMPROVED GATE CAPACITY FOR 3D NOR FLASH MEMORY Public/Granted day:2017-03-16
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