Invention Grant
US09590087B2 Compound gated semiconductor device having semiconductor field plate
有权
具有半导体场板的复合门控半导体器件
- Patent Title: Compound gated semiconductor device having semiconductor field plate
- Patent Title (中): 具有半导体场板的复合门控半导体器件
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Application No.: US14540535Application Date: 2014-11-13
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Publication No.: US09590087B2Publication Date: 2017-03-07
- Inventor: Wolfgang Werner , Frank Kahlmann , Franz Hirler
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/40 ; H01L29/66 ; H01L29/43 ; H01L29/06 ; H01L29/205 ; H01L29/423 ; H01L29/08 ; H01L29/20

Abstract:
A transistor includes a source, a drain spaced apart from the source, and a heterostructure body having a two-dimensional charge carrier gas channel for connecting the source and the drain. The transistor further includes a semiconductor field plate disposed between the source and the drain. The semiconductor field plate is configured to at least partly counterbalance charges in the drain when the transistor is in an off state in which the channel is interrupted and a blocking voltage is applied to the drain. The counterbalance charge provided by the semiconductor field plate is evenly distributed over a plane or volume of the semiconductor field plate. Various semiconductor field plate configurations and corresponding manufacturing methods are described herein.
Public/Granted literature
- US20160141405A1 Semiconductor Field Plate for Compound Semiconductor Devices Public/Granted day:2016-05-19
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