Invention Grant
- Patent Title: Plasma generator systems and methods of forming plasma
- Patent Title (中): 等离子体发生器系统和形成等离子体的方法
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Application No.: US12062052Application Date: 2008-04-03
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Publication No.: US09591738B2Publication Date: 2017-03-07
- Inventor: Huatan Qiu , David Cheung , Prashanth Kothnur
- Applicant: Huatan Qiu , David Cheung , Prashanth Kothnur
- Applicant Address: US CA Fremont
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Main IPC: H01L21/306
- IPC: H01L21/306 ; C23C16/00 ; H05H1/46 ; H01J37/32

Abstract:
Systems and methods of forming plasma are provided. In an embodiment, a plasma generator system is provided including a container, a single coil disposed around the container, the single coil being a single member and having a first end, a second end, a first winding, and a second winding, wherein the first winding extends from the first end, and the second winding is integrally formed as part of the first winding and extends to the second end, an energy source electrically coupled directly to the first end of the single member, and a capacitor electrically coupled directly to the second end of the single member.
Public/Granted literature
- US20090250334A1 PLASMA GENERATOR SYSTEMS AND METHODS OF FORMING PLASMA Public/Granted day:2009-10-08
Information query
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