Invention Grant
US09593295B2 Surfactants with lower CMC, and surfactant systems and detergents containing said surfactants
有权
具有较低CMC的表面活性剂和表面活性剂体系和含有所述表面活性剂的洗涤剂
- Patent Title: Surfactants with lower CMC, and surfactant systems and detergents containing said surfactants
- Patent Title (中): 具有较低CMC的表面活性剂和表面活性剂体系和含有所述表面活性剂的洗涤剂
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Application No.: US14813565Application Date: 2015-07-30
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Publication No.: US09593295B2Publication Date: 2017-03-14
- Inventor: Christian Kropf , Nicole Bode , Danuta Bedrunka , Roberto Rinaldi , Hebert Jesus Estevez Rivera
- Applicant: Henkel AG & Co. KGaA , Studiengesellschaft Kohle mbH
- Applicant Address: DE Duesseldorf DE Muelheim an der Ruhr
- Assignee: Henkel AG & Co. KGaA & Studiengesellschaft,Kohle mbH
- Current Assignee: Henkel AG & Co. KGaA & Studiengesellschaft,Kohle mbH
- Current Assignee Address: DE Duesseldorf DE Muelheim an der Ruhr
- Agent Thomas G. Krivulka
- Priority: DE102013001859 20130201
- Main IPC: C11D1/24
- IPC: C11D1/24 ; C11D1/29 ; C11D1/37 ; C11D1/72 ; C11D1/831 ; C07C309/42 ; C11D1/22 ; C11D1/83 ; C11D1/14
Abstract:
The invention relates to surfactants of the formula (I), in which R1 stands for —H or —CH3; R2, R3, R4, R5, R6 independently stand for —H, —CH3, —CH2CH3, —CH2CH2CH3, —CH(CH3)2, —CH2CH2CH2CH3, —CH2CH(CH3)2, —CH(CH3)CH2CH3, —C(CH3)3, —OH, —OCH3, —OCH2CH3, —OCH2CH2CH3, —OCH(CH3)2, a linear or branched alkyl group containing 8 to 20 C atoms, or —SO3−X+; X+ stands for a monovalent cation or the nth part of an n-valent cation; exactly one radical R2, R3, R4, R5, R6 stands for —SO3−X+; and exactly one radical R2, R3, R4, R5, R6 stands for a linear or branched alkyl radical containing 8 to 20 C atoms.
Public/Granted literature
- US20150337237A1 NOVEL SURFACTANTS WITH LOWER CMC, AND SURFACTANT SYSTEMS AND DETERGENTS CONTAINING SAID SURFACTANTS Public/Granted day:2015-11-26
Information query
