Abstract:
A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).
Abstract:
The present invention relates to a novel acylating agent, a method for its preparation, and a method of using it for acylating one or more amino groups of an amino acid, a peptide, or a protein. The novel acylating agent may be a compound which comprises a structural element —HN—(CH2)2-(O—((CH2)2)k-O—(CH2)n-CO—, wherein k is an integer in the range of 1-10, and n is an integer in the range of 1-2, being esterified at its —CO-end to the hydroxy group of 3,5-dichloro-2-hydroxy-benzenesulfonic acid (3,5-DC-2-HBSA). This novel acylating agent has an improved stability. Using this agent the acylation process is improved as regards robustness, as well as improving yield and overall production economy. The novel acylating agent is useful for acylating pharmaceutical peptides and proteins such as GLP-1, insulin, pYY, and amylin. The invention also relates to a number of novel GLP-1 precursor peptides and derivatives in which the two N-terminal amino acids have been deleted.
Abstract:
A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition including one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3), and an acid-decomposable resin.
Abstract:
The present invention provides a titanium ligand-modified black phosphorus and the preparation method and use thereof. The titanium ligand-modified black phosphorus is a complex of black phosphorus and a titanium ligand having a structure represented by formula (I): wherein in the formula (I), R1 comprises C1-C6 alkyl, or phenyl optionally further substituted with 0 to 5 groups each independently selected from halogen atom, C1-C6 alkyl, nitro, hydroxy, amino or C1-C3 alkoxy; the C1-C6 alkyl or C1-C3 alkoxy is optionally further substituted with 0 to 3 groups each independently selected from halogen atom, nitro, hydroxy, amino, methyl, ethyl or n-propyl. The titanium ligand-modified black phosphorus of the present invention is not likely oxidized without changing inherent properties of the black phosphorus, and the antioxidant capacity is greatly enhanced.
Abstract:
The present invention relates to the use of a 2,5-dihydroxybenzene derivative of formula (I) or a pharmaceutically acceptable salt, solvate, isomer, or prodrug thereof for the treatment and/or prophylaxis of, inter alia, skin cancer.
Abstract:
The invention relates to surfactants of the formula (I), in which R1 stands for —H or —CH3; R2, R3, R4, R5, R6 independently stand for —H, —CH3, —CH2CH3, —CH2CH2CH3, —CH(CH3)2, —CH2CH2CH2CH3, —CH2CH(CH3)2, —CH(CH3)CH2CH3, —C(CH3)3, —OH, —OCH3, —OCH2CH3, —OCH2CH2CH3, —OCH(CH3)2, a linear or branched alkyl group containing 8 to 20 C atoms, or —SO3−X+; X+ stands for a monovalent cation or the nth part of an n-valent cation; exactly one radical R2, R3, R4, R5, R6 stands for —SO3−X+; and exactly one radical R2, R3, R4, R5, R6 stands for a linear or branched alkyl radical containing 8 to 20 C atoms.
Abstract:
The present disclosure is directed to a reactive ester agent for conjugating a click-reactive group to a carrier molecule or solid support. The reactive ester agent has the general formula IA, wherein the variables R1, R2, R3, Ra and L are described throughout the application.
Abstract:
The present invention relates to quinolinium-derived single crystals for use in nonlinear optics, which exhibit high molecular orientation and macroscopic optical nonlinearity. When the quinolinium-derived crystals according to the present invention are applied to THz wave light sources, higher THz wave generating efficiency may be obtained as compared with inorganic crystals or existing organic crystals.
Abstract:
There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic cation or a metal cation,
Abstract translation:提供了一种新型化合物,高分子化合物,抗蚀剂组合物,酸产生剂和由通式(1-1)表示的化合物形成抗蚀剂图案的方法:其中R 1和R 3各自独立地表示单键或 二价连接基团; A表示二价连接基团; R2和R4各自独立地表示羟基,可以具有取代基的烃基或由通式(1-an1),(1-an2)或(1-an3)表示的基团),条件是至少一个 R 2和R 4表示由通式(1-an1),(1-an2)或(1-an3)表示的基团。 n0优选为0或1,并且其中Y1表示单键或-SO2-; R5表示1〜10个碳原子的直链或支链一价烃基,3〜20个碳原子的环状一价烃基或具有可被氟原子取代的环状部分结构的3〜20个碳原子的一价烃基; M +表示有机阳离子或金属阳离子,