发明授权
- 专利标题: Temperature-responsive cell culture substrate and method for producing the same
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申请号: US13124298申请日: 2009-10-14
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公开(公告)号: US09598668B2公开(公告)日: 2017-03-21
- 发明人: Manabu Mizutani , Hiroya Watanabe , Yuriko Kitano
- 申请人: Manabu Mizutani , Hiroya Watanabe , Yuriko Kitano
- 申请人地址: JP Tokyo
- 专利权人: CELLSEED INC.
- 当前专利权人: CELLSEED INC.
- 当前专利权人地址: JP Tokyo
- 代理机构: Nixon & Vanderhye PC
- 优先权: JP2008-288220 20081014
- 国际申请: PCT/JP2009/067774 WO 20091014
- 国际公布: WO2010/044417 WO 20100422
- 主分类号: C12M3/00
- IPC分类号: C12M3/00 ; C12N5/00 ; B29C59/16 ; C08J7/18 ; C12M1/22 ; C12M1/00 ; C12M1/12 ; C12M1/26 ; B29C35/08 ; B29K25/00
摘要:
A substrate having a pattern of two or more materials exhibiting different grafting efficiencies for a temperature-responsive polymer that varies its interaction with water in a temperature range of 0 to 80° C. by electron beam irradiation under the same conditions is grafted with the temperature-responsive polymer by simultaneously irradiating the surfaces of the materials with electron beams to obtain a temperature-responsive cell culture substrate. According to this method, a temperature-responsive cell culture substrate having a surface (1) that allows cells to adhere thereto and to grow thereon during cell culturing and that allows the adhering and grown cells to be detached therefrom by changing the culturing temperature and a surface (2) that does not allow the cells to adhere thereto at all can be obtained by a simple process.
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