Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US13748889Application Date: 2013-01-24
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Publication No.: US09606457B2Publication Date: 2017-03-28
- Inventor: Norbertus Josephus Martinus Van Den Nieuwelaar , Petrus Franciscus Van Gils , Arthur Erland Swaving
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/58 ; G03B27/32 ; G03F7/20 ; G03F7/00

Abstract:
A substrate handler for transferring substrates to be exposed from a track to a lithographic apparatus. The substrate handler comprises a controller. The controller is configured to determine an instance for starting a transfer process of a first one of the substrates. The instance is based on a predetermined processing characteristic of the lithographic apparatus, in order to maintain a transfer period of the substrate in the substrate handler substantially constant.
Public/Granted literature
- US20130215408A1 Lithographic Apparatus and Device Manufacturing Method Public/Granted day:2013-08-22
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