- 专利标题: Charged particle multi-beam apparatus including a manipulator device for manipulation of one or more charged particle beams
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申请号: US13484231申请日: 2012-05-30
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公开(公告)号: US09607806B2公开(公告)日: 2017-03-28
- 发明人: Aernout Christiaan Zonnevylle , Pieter Kruit
- 申请人: Aernout Christiaan Zonnevylle , Pieter Kruit
- 申请人地址: NL Delft
- 专利权人: MAPPER LITHOGRAPHY IP B.V.
- 当前专利权人: MAPPER LITHOGRAPHY IP B.V.
- 当前专利权人地址: NL Delft
- 代理机构: Blakely Sokoloff Taylor & Zafman LLP
- 优先权: NL2006868 20110530
- 主分类号: G21K1/08
- IPC分类号: G21K1/08 ; H01J37/30 ; H01J37/317 ; B82Y10/00 ; B82Y40/00
摘要:
The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.
公开/授权文献
- US20120305798A1 CHARGED PARTICLE MULTI-BEAMLET APPARATUS 公开/授权日:2012-12-06